High Temperature/Constant Temperature Oven HISPEC N Type

Description

Heat treatment of electronic components with copper or silver electrodes is carried out in an N2 gas atmosphere to prevent oxidation. This incubator was developed specifically for this type of special heat treatment. It achieves improved workability with a high N2 gas replacement rate, reduced N2 gas consumption, and shorter temperature drop times.

■ Guaranteed residual oxygen concentration of 100 ppm or less

The amount of N2 gas used has been reduced to 1/5 of the previous level, and residual oxygen concentrations of 100 ppm or less can be reproduced with high accuracy.

■Improved temperature reduction mechanism for improved productivity

With the door closed, the temperature can be lowered from 250°C to the workable temperature range 1.5 times faster than conventional devices (compared to our previous models). *To further speed up the temperature drop, use the water cooling mechanism (optional).

■Temperature uniformity improves heat treatment yield

Temperature distribution performance is guaranteed to be ±3.5°C (when set at 250°C).